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Proceedings Paper

Laser Interferometric Method For The Measurement Of Film Thickness, Using Holographic Optical Components
Author(s): K. Matsuda; M. Namiki
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Paper Abstract

An interference method for determination of the thickness of thin dielectric films deposited on metal substrates is described. The method uses the variation of multiple-beam interference of light reflected from the sample as the incident angle is changed. The effects of the phase change on reflection at the metal/dielectric interface are shown to be negligible for a MgF2 film deposited on Chromium. A working instrument is described which uses holographic lenses to obtain the large scan angles required with low aberration. The results obtained with this instrument agree well with those obtained using a Talysurf.

Paper Details

Date Published: 16 January 1988
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Proc. SPIE 0952, Laser Technologies in Industry, (16 January 1988); doi: 10.1117/12.968846
Show Author Affiliations
K. Matsuda, Mechanical Enaineerina Laboratory (Japan)
M. Namiki, Mechanical Engineering Laboratory (Japan)


Published in SPIE Proceedings Vol. 0952:
Laser Technologies in Industry

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