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Proceedings Paper

Resist Modeling Near Resolution And Sensitivity Limits In X -Ray Lithography
Author(s): H. Oertel; M. Weiss; J. Chlebek; H. L. Huber; R. Dammel; C. R. Lindley; J. Lingnau; J. Theis
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Paper Details

Date Published: 1 August 1989
PDF: 20 pages
Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); doi: 10.1117/12.968537
Show Author Affiliations
H. Oertel, Fraunhofer Institut fur Mikrostrukturtechnik - IMT (Germany)
M. Weiss, Fraunhofer Institut fur Mikrostrukturtechnik - IMT (Germany)
J. Chlebek, Fraunhofer Institut fur Mikrostrukturtechnik - IMT (Germany)
H. L. Huber, Fraunhofer Institut fur Mikrostrukturtechnik - IMT (Germany)
R. Dammel, Hoechst AG Corporate Research (Germany)
C. R. Lindley, Hoechst AG Corporate Research (Germany)
J. Lingnau, Hoechst AG Corporate Research (Germany)
J. Theis, Hoechst AG Corporate Research (Germany)


Published in SPIE Proceedings Vol. 1089:
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII
Arnold W. Yanof, Editor(s)

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