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Proceedings Paper

The Application Of Ion Beam Assisted Deposition Of Chrome To Photomask Repair
Author(s): W. P. Robinson
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Paper Abstract

The MicroBeam NanoFix-50 photomask repair system and the NanoFab-150 nanolithography system are advanced focused ion beam systems which can produce highintensity beams having current densities exceeding 5A/cm2. When such a high current density beam interacts with a solid, significant sputtering, heating, and implantation result. Localized power densities up to 750kW/cm2 can be present. In addition, ambient gas molecules impact the surface under bombardment, interacting physically and chemically, modifying the top atomic layers of the solid. The conditions at the beam impact point are thus extreme and complex.

Paper Details

Date Published: 1 August 1989
PDF: 12 pages
Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); doi: 10.1117/12.968531
Show Author Affiliations
W. P. Robinson, MicroBeam, Incorporated (United States)

Published in SPIE Proceedings Vol. 1089:
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII
Arnold W. Yanof, Editor(s)

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