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Proceedings Paper

Development Of Radiation Cooled Slotted Rotating Target X-Ray Source
Author(s): M. Asano; T. Tagawa; H. Yoshikawa; S. Hattori
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Paper Abstract

We have constructed, as a first trial, a high intensity X-ray source with e-beam exited target for the microlithography. This system is developed for the purpose of laboratory and test use, and is now in the process of experiment stage. The Pd coated e-beam target generates characteristic X-ray of 4.4Å wave length. It is remarkable that both the radiation cooling mechanism and stable rotating construction can increase the X-ray intensity and reduce the source spot size. According to the previous work, the design consideration gives a resolution 0.13μm and a throughput 1.8s/cm2 by using a resist having sensitivity 25mJ/cm2. In this paper, the practical design for the first construction such as X-ray intensity, rotating stability, cooling efficiency and evacuation performance are discussed. Subsequently the appearance of apparatus and the state of experiment are also described.

Paper Details

Date Published: 1 August 1989
PDF: 8 pages
Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); doi: 10.1117/12.968530
Show Author Affiliations
M. Asano, MEITEC Corporation (Japan)
T. Tagawa, MEITEC Corporation (Japan)
H. Yoshikawa, ULVAC Corporation (Japan)
S. Hattori, Nagoya University (Japan)

Published in SPIE Proceedings Vol. 1089:
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII
Arnold W. Yanof, Editor(s)

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