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Proceedings Paper

Automatic Mask Inspection System Using X-ray As A Source
Author(s): Hiroshi Miyake; Takahide Iida; Kensuke Miwa; Toshiyuki Shibata; Akihiro Yoshida; Yoshiyuki Uchida; Shuzo Hattori
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Paper Abstract

A fundamental concept to realize the automatic X-ray mask inspection system using X-ray as a source is shown, and main elemental technologies of the X-ray mask inspection system having been developed in conjunction with the concept is described in this report. Die-to-die comparison rather than absolute inspection in relation to the design data is the purpose of our X-ray mask inspection. An array of X-ray aperture of picture elements both X and Y sides being equal to the design rule of the pattern is used to select the picture elements to be processed parallel in which numbers of identical plural pixels are in X-ray mask if there is no defects. If the transmitted X-ray flux through one of the picture element among selected plural pixels shows material difference in intensity from others, it is then considered as defect. After the first set of picture elements in the die-to-die comparison is completed, the X-ray aperture array is moved by distance being equal to the design rule of the X-ray mask. Similarly other plural pixels of the X-ray mask are inspected in same manner as above. Repetition of this process to scan an area encompassed by a single X-ray aperture pitch make it possible to inspect all the area of the X-ray mask efficiently. Therefore, by using the X-ray aperture array composed of 250x250 array of 0.5μ mx0.5μ m square transparent aperture with two dimensional pitch of 100μ mx100μ m and TV camera having 250x250 array of light sensitive elements, all the area of the X-ray mask with two dimensional length of 25mmx25mm can be inspected only in 44 minutes.

Paper Details

Date Published: 1 August 1989
PDF: 9 pages
Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); doi: 10.1117/12.968527
Show Author Affiliations
Hiroshi Miyake, Toyoda Automatic Loom Works Ltd. (Japan)
Takahide Iida, Toyoda Automatic Loom Works Ltd. (Japan)
Kensuke Miwa, Toyoda Automatic Loom Works Ltd. (Japan)
Toshiyuki Shibata, Toyoda Automatic Loom Works Ltd. (Japan)
Akihiro Yoshida, Toyoda Automatic Loom Works Ltd. (Japan)
Yoshiyuki Uchida, Aichi Institute of Technology (Japan)
Shuzo Hattori, Nagoya University (Japan)


Published in SPIE Proceedings Vol. 1089:
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII
Arnold W. Yanof, Editor(s)

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