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Proceedings Paper

Synchrotron X-ray Lithography System Using A Compact Source
Author(s): Toyoki Kitayama; Toa Hayasaka; Hideo Yoshihara; Sunao Ishihara
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Paper Abstract

Synchrotron radiation x-rays are effective and powerful sources for x-ray lithography when semiconductor feature size is less than a half micron. A compact synchrotron radiation ring comprising superconducting magnets was developed as an x-ray lithography source. An x-ray exposure system, including a beam line and a vertical stepper, was also developed. Several test exposures confirmed that this synchrotron lithography system is applicable to quarter-micron x-ray lithography.

Paper Details

Date Published: 1 August 1989
PDF: 5 pages
Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); doi: 10.1117/12.968524
Show Author Affiliations
Toyoki Kitayama, NTT LSI Laboratories (Japan)
Toa Hayasaka, NTT LSI Laboratories (Japan)
Hideo Yoshihara, NTT LSI Laboratories (Japan)
Sunao Ishihara, NTT LSI Laboratories (Japan)


Published in SPIE Proceedings Vol. 1089:
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII
Arnold W. Yanof, Editor(s)

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