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Proceedings Paper

Repair Of Dear Defects On X-Ray Masks By Ion-Induced Metal Deposition
Author(s): Hans-Christian Petzold; Helmut Burghause; Renate Putzar; Uwe Weigmann; Nicholas P. Economou; Lewis A. Stern
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Paper Abstract

To investigate the repair of clear defects on X-ray masks by ion-induced metal deposition, a photomask repair system was modified to allow for the localized deposition of tungsten from a gas jet of W(CO)6 vapor. With this system, dense W layers could be deposited at rates of up to 4 nm/s; the X-ray opacity of layers having a thickness of down to 200 nm was demonstrated by X-ray lithographic resist exposures using synchrotron radiation.

Paper Details

Date Published: 1 August 1989
PDF: 7 pages
Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); doi: 10.1117/12.968513
Show Author Affiliations
Hans-Christian Petzold, Fraunhofer-Institut fur Mikrostrukturtechnik (Germany)
Helmut Burghause, Fraunhofer-Institut fur Mikrostrukturtechnik (Germany)
Renate Putzar, Fraunhofer-Institut fur Mikrostrukturtechnik (Germany)
Uwe Weigmann, Fraunhofer-Institut fur Mikrostrukturtechnik (Germany)
Nicholas P. Economou, Micrion Corporation (United States)
Lewis A. Stern, Micrion Corporation (United States)


Published in SPIE Proceedings Vol. 1089:
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII
Arnold W. Yanof, Editor(s)

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