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Proceedings Paper

Focused Ion Beam Patterning of High Tc Superconductor Films
Author(s): L. R. Harriott; P. A. Polakos
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Paper Abstract

We have used a 20 keV Ga focussed ion beam to pattern superconducting submicron bridge structures in thin films of Ba2YCu307 material by physical sputtering. The technique can produce structures down to 0.5 microns or less in epitaxial films with no degradation in superconducting transition temperature (Tc) or critical current density (Jo). Photolithography was used to define a coarse pattern of 20 micron wide and 50 micron long strips, each wired for four-terminal resistance measurements. Sub-micron constrictions were then milled by the focused ion beam to form weak-link junctions with roughly 0.3 microns separating the superconducting banks. We have demonstrated that focused ion beam micromachining is capable of producing submicron sized superconducting structures and is a suitable technique for fabricating devices such as SQUIDS and the study of grain boundary effects in the films.

Paper Details

Date Published: 1 August 1989
PDF: 9 pages
Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); doi: 10.1117/12.968508
Show Author Affiliations
L. R. Harriott, AT&T Bell Laboratories (United States)
P. A. Polakos, AT&T Bell Laboratories (United States)


Published in SPIE Proceedings Vol. 1089:
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII
Arnold W. Yanof, Editor(s)

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