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Proceedings Paper

A Compact Optical Imaging System For Resist Process And Lithography Research
Author(s): John H. Bruning; William Oldham
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Paper Abstract

A compact small field 20:1 reduction optical imaging system has been developed to provide a stable platform for printing submicron lithographic images at 248nm in resist without the cost and complexity of production equipment. The target applications are those in the areas of process development for resists in UV and deep UV and R&D laboratories and universities doing image science. In all of these applications, the normal issues of production lithography such as throughput, field size, automated substrate handling, etc. are unimportant. A simple bench top lithography system without these production oriented constraints is described.

Paper Details

Date Published: 1 January 1988
PDF: 5 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968448
Show Author Affiliations
John H. Bruning, GCA/Tropel Division (United States)
William Oldham, Univ. California (United States)


Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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