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Proceedings Paper

Chromium Mask Damage In Excimer Laser Projection Processing
Author(s): J. T.C. Yeh
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Paper Abstract

Cr masks used for conventional optical lithography were evaluated for their damage under excimer laser irradiation at 248 nm and 308 nm. The damage of Cr films on quartz ranged from erosion of pattern edges to total ablation depending on the fluence. At low fluences, cumulative stressing of the Cr films by the laser pulses leads to development of fine cracks. Difference in damage threshold at 248 nm and 308 nm was observed.

Paper Details

Date Published: 1 January 1988
PDF: 5 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968446
Show Author Affiliations
J. T.C. Yeh, IBM Research Division (United States)


Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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