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Proceedings Paper

The Design Of Excimer Lasers For Use In Microlithography
Author(s): T. A. Znotins; T. J. McKee; S. J. Gutz; K. O. Tan; W. B. Norris
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Paper Abstract

This paper discusses the different factors which need to be addressed in the development of excimer lasers for use in microlithography. Included is a brief description of the basics of excimer laser technology and a short history of the use of excimer lasers in microlithography. Emphasis is placed on the differences between excimer lasers designed for use in microlithography and conventional excimer lasers. The paper concludes with a discussion of maintenance issues and operating costs.

Paper Details

Date Published: 1 January 1988
PDF: 7 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968445
Show Author Affiliations
T. A. Znotins, Lumonics Inc (Canada)
T. J. McKee, Lumonics Inc (Canada)
S. J. Gutz, Lumonics Inc (Canada)
K. O. Tan, Lumonics Inc (Canada)
W. B. Norris, Lumonics Inc (Canada)

Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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