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Proceedings Paper

Computerized Wavelength Stabilized 248.4 Nm Excimer Laser For Stepper
Author(s): B. Ruckle; P. Lokai; H. Rosenkranz; B. Nikolaus; H. J. Kahlert; B. Burghardt; D. Basting; W. Muckenheim
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Paper Abstract

A single stage excimer laser for UV microlithography has been developed. It emits 2 Watt average power at about 248.4 nm with a bandwidth of 0.5 cm -1. A novel computer-controlled feedback circuitry provides for automatic stabilization of both average power and integrated bandwidth. In addition, a computer-controlled frequency stabilization unit makes that new laser ready for industrial use as light source in deep UV microlithography.

Paper Details

Date Published: 1 January 1988
PDF: 4 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968444
Show Author Affiliations
B. Ruckle, Lambda Physik GmbH (Germany)
P. Lokai, Lambda Physik GmbH (Germany)
H. Rosenkranz, Lambda Physik GmbH (Germany)
B. Nikolaus, Lambda Physik GmbH (Germany)
H. J. Kahlert, Lambda Physik GmbH (Germany)
B. Burghardt, Lambda Physik GmbH (Germany)
D. Basting, Lambda Physik GmbH (Germany)
W. Muckenheim, Lambda Physik GmbH (Germany)

Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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