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Proceedings Paper

Effect Of Temporal And Spatial Coherence Of Light Source On Patterning Characteristics In KrF Excimer Laser Lithography
Author(s): Yoshiharu Ozaki; Kiichi Takamoto; Akira Yoshikawa
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Paper Abstract

Interference patterns are produced by point light sources originating from an optical integrator. Influence of laser light coherence on interference pattern contrast is examined analytically and experimentally. The contrast is independent of temporal coherence and dependent on spatial coherence. The modulus of the complex coherence factor remains between 0.35 and 0.55 for the number of transverse modes between 30 and 240. The interference pattern can be eliminated by rotating the optical integrator. Resolution dependence on spectral bandwidth is experimentally examined using an NA=0.42 non-achromatic projection lens. Dependence of lens resolution on spectral bandwidth is greater than that estimated from MTF curve.

Paper Details

Date Published: 1 January 1988
PDF: 6 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968443
Show Author Affiliations
Yoshiharu Ozaki, NTT LSI Laboratories (Japan)
Kiichi Takamoto, NTT LSI Laboratories (Japan)
Akira Yoshikawa, NTT LSI Laboratories (Japan)

Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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