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Proceedings Paper

Exposure Dose Control Techniques For Excimer Laser Lithography
Author(s): David H. Tracy; Fred Y. Wu
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Paper Abstract

Measurements of pulse-to-pulse energy fluctuation statistics were made at several wave-lengths for a commercial discharge pumped excimer laser, under a variety of operating conditions. Various approaches to achieving accurate exposure dose control in microlithographic exposure tools using noisy pulsed sources are discussed. A pulse-by-pulse active control technique for static field lithography is described in detail, together with measured performance data. Alternative techniques suitable for one dimensional scanning slit field exposure tools are presented.

Paper Details

Date Published: 1 January 1988
PDF: 7 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968442
Show Author Affiliations
David H. Tracy, Perkin Elmer Corporation (United States)
Fred Y. Wu, IBM Corporation (United States)


Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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