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Proceedings Paper

Excimer Laser Photolithography With 1:1 Wynne-Dyson Optics
Author(s): F. N. Goodall; R. A. Lawes
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Paper Abstract

Excimer laser lithography will extend optical techniques to deep-uv wavelengths and enable linewidths at 0.5μm or below to be printed routinely. The main problems concern the development of suitable lenses, resist technology and alignment systems. This paper addresses mainly the first problem, from the viewpoint of 1:1 Wynne-Dyson optics. Two lenses are discussed, one operating at λ = 249nm and the other at λ = 193nm which is currently undergoing evaluation.

Paper Details

Date Published: 1 January 1988
PDF: 7 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968439
Show Author Affiliations
F. N. Goodall, Rutherford Appleton Laboratory (United States)
R. A. Lawes, Rutherford Appleton Laboratory (United States)

Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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