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Proceedings Paper

Performance Of A KrF Excimer Laser Stepper
Author(s): Roger W. McCleary; Paul J. Tompkins; Michael D. Dunn; Kenneth F. Walsh; John F. Conway; Ronald P. Mueller
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Paper Abstract

Device design criteria of half micrometer linewidths have driven optical lithography to extend its imaging wavelengths into the deep ultraviolet region. Excimer lasers are the only source that produces the high spectral brightness required by projection lenses at these wavelengths. A spectral line narrowed KrF (2484 Angstrom) excimer laser and a new illuminator have been developed and integrated with current DSW Wafer Stepper® technology. The integration of these new features require the design of control subsystems to monitor and control parameters such as wavelength and temperature. Wavelength must be tuned and stabilized to optimize the resolution and distortion performance of the reduction lens. The effects of temperature and bandwidth are also important to lens performance criteria, for example astigmatism, distortion, and contrast. Acceptance results for an excimer stepper will be discussed with special emphasis on resolution capability, illumination uniformity, focus stability, and dose repeatability.

Paper Details

Date Published: 1 January 1988
PDF: 4 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968437
Show Author Affiliations
Roger W. McCleary, GCA Corporation (United States)
Paul J. Tompkins, GCA Corporation (United States)
Michael D. Dunn, GCA Corporation (United States)
Kenneth F. Walsh, GCA Corporation (United States)
John F. Conway, IBM Corporation (United States)
Ronald P. Mueller, IBM Corporation (United States)

Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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