Share Email Print

Proceedings Paper

Bench Evaluation Of Lithographic Lenses From Measurements Of The Point Spread Function
Author(s): Norman Bobroff; Petra Fadi; Alan E. Rosenbluth; Douglas S. Goodman
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Image quality criteria derived from the point spread function (PSF) are useful for testing lithographic lenses. The Strehl ratio (SR) is a particularly simple and powerful measure of lens quality which is readily accessible from measurements of the PSF. The SR correlates well with traditional figures of merit such as the mean square wavefront aberration and the modulation transfer function. For object dimensions on the order of X/NA, the SR is a direct measure of the field dependent variation of exposure dose caused by lens aberrations. In this sense, the SR connects the lens quality to the final pattern definition in the image recording medium. Experimental aspects of the PSF measurement are emphasized. The lens test bench used to measure the value of the SR through focus and with field position is described. Data showing the PSF, and the field and focus dependence of the SR, are presented for high resolution Hg I-line and G-line lenses.

Paper Details

Date Published: 1 January 1988
PDF: 11 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968435
Show Author Affiliations
Norman Bobroff, IBM Thomas J. Watson Research Ctr (United States)
Petra Fadi, IBM Thomas J. Watson Research Ctr (United States)
Alan E. Rosenbluth, IBM Thomas J. Watson Research Ctr (United States)
Douglas S. Goodman, IBM Thomas J. Watson Research Ctr (United States)

Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

© SPIE. Terms of Use
Back to Top