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Proceedings Paper

A Stepper Image Monitor For Precise Setup And Characterization
Author(s): T. A. Brunner; S. Cheng; A. E. Norton
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Paper Abstract

The Stepper Image Monitor(SIM) system tests the resolution and overlay performance of complete stepper systems by measuring the aerial image intensity profile at many wafer locations and focus offsets. Overlay error vectors can be measured with a precision of .02μm and best focus can be determined to a precision of O.lμm without exposing test wafers. New data will be presented on lens heating effects, along with a simple model. Imagery of high NA steppers will be explored by observing image profiles of various sub-micron lines. A new poly-on-oxide process to fabricate permanent SIM reference wafers will be described. This paper will describe other recent developments which have made SIM techniques broadly applicable to many practical problems of stepper setup and characterization.

Paper Details

Date Published: 1 January 1988
PDF: 10 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968434
Show Author Affiliations
T. A. Brunner, Xerox Palo Alto Research Center (United States)
S. Cheng, StepperVision, Inc. (United States)
A. E. Norton, StepperVision, Inc. (United States)

Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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