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Proceedings Paper

A Submicron Lithography Process Using Philips I-Line Stepper
Author(s): Guido van der Looij; Venkat Nagaswami; Peter Baltussen; Peter Hartog; Rene Vervoordeldonk; Joost Moonen
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Paper Abstract

Recent advances in lens design have pushed optical lithography well into the submicron domain which was once considered to belong to X-ray or E-beam lithography. Realisation of submicron design rules of a 1 Mbit memory has been possible at PHILIPS using an i-line lens (Zeiss 10-78-48) incorporated in internally developed stepper (Sire-3) using a single layer resist technology. This paper will give a schematic description of the stepper and describe the lens characteristics of the two in house systems. The stability of the steppers will be illustrated by means of system parameters which were monitored during a prolonged period. The resist process was characterised on accelerated pathfinder lots which were used to detect lithography related problems in an earlier phase and to determine machine and process latitudes. The results of this characterisation and implementation activity will be reported. Special attention was given to focus determination which proved to be very critical due to the lens characteristics and large chip-size. Finally the results obtained on the 1M SRAM device with 0.7 ium minimum geometry will be presented. Based on this work it appears that with proper planarization procedures for minimizing the topography problems, a 0.7 μm design rule is practical using single layer resist on this stepper.

Paper Details

Date Published: 1 January 1988
PDF: 13 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968432
Show Author Affiliations
Guido van der Looij, Philips Research Laboratorie (The Netherlands)
Venkat Nagaswami, Philips Research Laboratories (The Netherlands)
Peter Baltussen, Philips Research Laboratories (The Netherlands)
Peter Hartog, Philips Research Laboratories (The Netherlands)
Rene Vervoordeldonk, Philips Research Laboratories (The Netherlands)
Joost Moonen, Philips Research Laboratories (The Netherlands)


Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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