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Proceedings Paper

Routes To Half-Micron Lithography
Author(s): Setha G. Olson; John H. Bruning; Michael C. King
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Paper Abstract

Alternative routes to 0.5μm lithography made possible by new developments in lenses, excimer lasers and resists are discussed. Steppers using excimer laser illumination with wavelength of 248nm provide 0.5μm lithography. Advanced processing techniques such as image reversal and contrast enhancement materials, make possible dramatic increases in resolution. New higher numerical aperture i-line lenses coupled with these processes also provide 0.5μm lithography. Experimental results illustrate the possibilities and trade-offs of alternate technologies.

Paper Details

Date Published: 1 January 1988
PDF: 9 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968427
Show Author Affiliations
Setha G. Olson, GCA Corporation (United States)
John H. Bruning, GCA Corporation (United States)
Michael C. King, Ion Microfabrication Systems (United States)


Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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