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Proceedings Paper

The Future Of Projection Lenses And The New G-Line Lens For 0.7 µm Lithography
Author(s): Masakatsu Ohta; Toshiyuki Kojima; Chiaki Sato; Tohru Ogawa; Miyoko Noguchi
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Paper Abstract

This paper describes the development of g-line projection lenses as shown by an investigation of the decreasing value of focus depth due to lens production errors. It presents a study of the decreasing value and forecasts what the depth of focus will be for each linewidth in optical lithography in the next several years. Next we report the image performance of a new lens with a high numerical aperture that has been developed recently. This is the 5x reduction lens with a field size of 15 mm square (21.2 mm diameter) and a numerical aperture that is switchable between 0.48 and 0.43. The practical resolution is 0.7 μm and distortion is less than 0.1 μm over the image field. The depth of focus is in the range of 1.5 μm. In addition, we report the potential of this lens for achieving a resolution of less than 0.6 μm.

Paper Details

Date Published: 1 January 1988
PDF: 9 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968426
Show Author Affiliations
Masakatsu Ohta, Canon Inc (Japan)
Toshiyuki Kojima, Canon Inc (Japan)
Chiaki Sato, Canon Inc (Japan)
Tohru Ogawa, Canon Inc (Japan)
Miyoko Noguchi, Canon Inc (Japan)

Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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