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Proceedings Paper

Simulation Of Proximity Printing
Author(s): K. I. Arshak; N. N. Kundu; S. N. Gupta
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Paper Abstract

Proximity Printing is a simple, high throughput non-contact method for wafer exposure. Image quality of such a system is limited by the diffraction of light at the edges of object. This causes exposure variation in resist and hence image distortion. Proximity printing process has been simulated for lithography purpose. Computations were done for an array of apertures. Aperture separation and aperture to substrate gap have been varied to see the effect on image intensity distributions. Some experiments were done using Cobilt aligner in proximity mode. Microphotographs of resist image were taken & compared with the 3D Plot of computed results. Good agreement is observed.

Paper Details

Date Published: 1 January 1988
PDF: 6 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968420
Show Author Affiliations
K. I. Arshak, National Institute for Higher Education (Ireland)
N. N. Kundu, Central Electronics Engineering Research Institute (India)
S. N. Gupta, Central Electronics Engineering Research Institute (India)


Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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