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Proceedings Paper

Subhalfmicronic Contact Printing Lithography Using A Microwave Powered Deep UV Source
Author(s): Andre P. Weill; Jean-Marc Francou; Jean-Pierre Panabiere
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Paper Abstract

Microwave energized bulbs are deep UV sources, which are well suited to applications requiring high light intensities of within the 200-260 nm wavelength range. This deep UV source has to date only been used either for transferring the photoresist patterns from the imaging layer to the planarizing layer of a PCM bilevel structure, or for photostabilizing the patterns delineated in a novolac based photoresist. So far, nobody has made use of the inherent resolution capability of the microwave powered deep UV light beam. The subhalfmicronic lithographic process described in this paper associates the resolution capability of the FUSION ILLUMINATOR 100 system with the contact performances of a K. SUSS mask aligner. Vacuum contact printing reaches the 0.3-0.5 )m resolution range for exposure times reduced to less than one minute. This paper presents and discusses results obtained by vacuum contact printing over W or Si02 layers.

Paper Details

Date Published: 1 January 1988
PDF: 5 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968419
Show Author Affiliations
Andre P. Weill, Centre National d'Etudes des Telecommunications (France)
Jean-Marc Francou, Centre National d'Etudes des Telecommunications (France)
Jean-Pierre Panabiere, Centre National d'Etudes des Telecommunications (France)


Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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