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Proceedings Paper

Optical-Diffraction-Based Modulation Of Photoresist Profile For Microlithography Applications. The "Optical" Tapering Of Contacts And Vias.
Author(s): Marco I. Buraschi; Laura Bacci; Giorgio De Santi
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Paper Abstract

A novel way to obtain tapered profile in photoresist is proposed. Opening at the mask level near the principal features, some slits smaller than the resolution limit of the projection optic at a distance also smaller than it, we can obtain a controlled sloped profile in photoresist. We have already applied this method to open tapered contacts and vias without using the thermal-reflow tecnique of BPSG optimizing the configuration of the subresolved slits. There is the experimental evidence that it is retained the possibility to open contacts up to the diffraction limit of the projection optics. Our method is Patent Pending .

Paper Details

Date Published: 1 January 1988
PDF: 8 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968418
Show Author Affiliations
Marco I. Buraschi, SGS-Thomson Microelectronics (Italy)
Laura Bacci, SGS-Thomson Microelectronics (Italy)
Giorgio De Santi, SGS-Thomson Microelectronics (Italy)

Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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