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Proceedings Paper

Polarization Dependence Of Diffraction By High Resolution Masks
Author(s): William E. Haller; Andrew R. Neureuther
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Paper Abstract

Diffraction by small open lines in chrome (slits) has been measured and the data compared to scalar diffraction theory. The measurement system consists of a chopped HeNe laser illumination, a mask held by a translational and rotational stage, and a photomultiplier tube on a revolving arm connected to a lock-in amplifier under the control of an IBM PC XT computer. Results for slits down to a wavelength in size show transmission nearly proportional to slit size and only slight polarization effects. Initial plots of total transmitted power divided by slit size showed a decrease for small slits. However, correcting for mask bias and/or edge roughness shows agreement with rigorous electromagnetic theory.

Paper Details

Date Published: 1 January 1988
PDF: 6 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968410
Show Author Affiliations
William E. Haller, University of California Berkeley (United States)
Andrew R. Neureuther, University of California Berkeley (United States)

Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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