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Proceedings Paper

Photospeed Quality Control In Photoresist Manufacturing
Author(s): Jeffrey K. Hecht; Barbara J. Brown; Edward J. Reardon
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Paper Abstract

Process windows have shrunk dramatically with the advent of micron and submicron processes in semiconductor manufacturing. Because of this trend, photospeed testing has become an especially critical aspect of photoresist quality control. The purpose of this paper is to describe and evaluate and test methods which can be used by a manufacturer to qualify resist lots. In addition, the applications and benefits of Statistical Quality Control and photospeed certification programs are discussed.

Paper Details

Date Published: 1 January 1988
PDF: 6 pages
Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); doi: 10.1117/12.968393
Show Author Affiliations
Jeffrey K. Hecht, Morton Thiokol Inc (United States)
Barbara J. Brown, Morton Thiokol Inc (United States)
Edward J. Reardon, Morton Thiokol Inc (United States)


Published in SPIE Proceedings Vol. 0921:
Integrated Circuit Metrology, Inspection, and Process Control II
Kevin M. Monahan, Editor(s)

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