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Proceedings Paper

Reliable Automatic Measurements Of Critical Dimensions Using S.E.M.
Author(s): Herve Martin; Daniel Burlet; Jean Luc Bataillon; Bruno Latombe
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Paper Abstract

The use of S.E.M. for Critical Dimensions is increasing with the need for measurements of less than 1 micron linewidth. This technique is so tedious that it is only acceptable if the measurements can be made in automatic mode. Therefore many difficulties appear such as charge effects which can lead to results containing a few false measurements. In the first method called Signal Recognition method the features of the extreme transitions determined in a preliminary calibration experiment are retained. To attenuate the noise and improve the speed of the treatment only a reduced number of points of the electron profile are taken into account. Thus the measurement uses a threshold zone to take into account the main points of the transition on the actual profile. The previous method must be adjusted for each new layer. Therefore another method was found which uses signal processing on the electron profile and is independent of the layers. The charges effects are attenuated by filtering the spatial frequencies and all the information contained in the edge transitions is taken into consideration. No precise settings of threshold are therefore needed In both cases these methods provide reliable measurements which allow the S.E.M. to be used as a routine metrology tool.

Paper Details

Date Published: 1 January 1988
PDF: 9 pages
Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); doi: 10.1117/12.968386
Show Author Affiliations
Herve Martin, Centre National d'Etudes des Telecommunications (France)
Daniel Burlet, Centre National d'Etudes des Telecommunications (France)
Jean Luc Bataillon, Centre National d'Etudes des Telecommunications (France)
Bruno Latombe, Centre National d'Etudes des Telecommunications (France)

Published in SPIE Proceedings Vol. 0921:
Integrated Circuit Metrology, Inspection, and Process Control II
Kevin M. Monahan, Editor(s)

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