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Proceedings Paper

Photolithography Expert Systems At National Semiconductor
Author(s): Pilla A. Leitner; Robert L. Brown
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Paper Abstract

Two expert systems for photolithography are discussed and compared. The systems are found to be beneficial to both engineers and technicians. Important implementation issues are presented.

Paper Details

Date Published: 1 January 1988
PDF: 4 pages
Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); doi: 10.1117/12.968377
Show Author Affiliations
Pilla A. Leitner, National Semiconductor Corporation (United States)
Robert L. Brown, National Semiconductor Corporation (United States)

Published in SPIE Proceedings Vol. 0921:
Integrated Circuit Metrology, Inspection, and Process Control II
Kevin M. Monahan, Editor(s)

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