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Proceedings Paper

Nanometrology And Super-Resolution Imaging Of Oxide Isolation Structures Using A Confocal Scanning Laser Microscope
Author(s): Kevin M. Monahan; James Chen
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Paper Abstract

A confocal scanning laser microscope (CSLM) has been used to study a variety of oxide isolation techniques including the LOCOS, S-LOCOS, SWAMI, and M-SWAMI structures. The focal plane sensitivity of the confocal microscope was used to deconvolve effects due to refraction, reflection, and interference of 488nm light propagating in these structures. Elementary optical theory due to Fraunhofer and Fizeau was used to rationalize the data and to permit correlation with physical profiles in both the lateral and vertical directions. We found that considerable enhancement of the instrumental precision could be obtained by adjusting the CSLM to operate at 8000X or greater magnification and by using a saturation threshold technique to acquire focal plane data. The signal-to-noise limited measurement capablity of the system appears to be about 0.07μm with standard deviations of 10%. The standard error of the mean over 49 linescan measurements is about one nanometer.

Paper Details

Date Published: 1 January 1988
PDF: 10 pages
Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); doi: 10.1117/12.968365
Show Author Affiliations
Kevin M. Monahan, Philips Research Laboratories/Signetics Corporation (United States)
James Chen, Philips Research Laboratories/Signetics Corporation (United States)


Published in SPIE Proceedings Vol. 0921:
Integrated Circuit Metrology, Inspection, and Process Control II
Kevin M. Monahan, Editor(s)

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