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Proceedings Paper

A New Reticle Set For Electrical Measurement Of Resolution, Proximity, Topography, Sidewall Spacer, And Stacked-Gate Structures
Author(s): W. L. Stevenson
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Paper Abstract

The characterization of photolithographic resolution, proximity-imaging effects, topographic dependence, side-wall spacers, and stacked-gate etch is greatly facilitated through the use of microelectronic test structures. The test modules required were specifically designed to mimick typical linewidth structures that occur as a result of integrated circuit processing. The modules were designed into a generic test reticle set. The reticle set has been implemented on ASM, GCA, Nikon, and Ultratech Steppers. This paper describes the test structures, the measurement sequences, and presents examples of results to demonstrate the versatility and application of this design.

Paper Details

Date Published: 1 January 1988
PDF: 12 pages
Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); doi: 10.1117/12.968363
Show Author Affiliations
W. L. Stevenson, Philips Research Laboratories Sunnyvale (United States)

Published in SPIE Proceedings Vol. 0921:
Integrated Circuit Metrology, Inspection, and Process Control II
Kevin M. Monahan, Editor(s)

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