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Proceedings Paper

Technologies For Automated In-Process E-Beam Metrology
Author(s): Israel Nadler-Niv; Uriel Halavee
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Paper Abstract

A new wafer metrology system, featuring high throughput, automation, and E-beam accuracy has been developed. Novel technologies were integrated into the system in order to meet the stringent requirements of in-process VLSI critical dimension control.

Paper Details

Date Published: 1 January 1988
PDF: 14 pages
Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); doi: 10.1117/12.968346
Show Author Affiliations
Israel Nadler-Niv, Opal Technologies, Ltd. (Israel)
Uriel Halavee, Opal, Inc. (United States)

Published in SPIE Proceedings Vol. 0921:
Integrated Circuit Metrology, Inspection, and Process Control II
Kevin M. Monahan, Editor(s)

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