Share Email Print

Proceedings Paper

Photoresist As It's Own Process Monitor
Author(s): M. P. C. Watts; T. Perrera; B. Ozarski; D. Meyers; R. Tan
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A new method of monitoring a photoresist process is described, in which the changes in the physical and chemical properties of the photoresist act as the monitor for each process step. This method provides unique insights into the photo process by independently monitoring each step and substantially improving the quantitative accuracy at each step. Examples of the potential of this method for process monitoring and process control improvements are given.

Paper Details

Date Published: 1 January 1988
PDF: 10 pages
Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); doi: 10.1117/12.968341
Show Author Affiliations
M. P. C. Watts, AZ Photoresist Products (United States)
T. Perrera, AZ Photoresist Products (United States)
B. Ozarski, Ionscan (United States)
D. Meyers, Ionscan (United States)
R. Tan, Ionscan (United States)

Published in SPIE Proceedings Vol. 0920:
Advances in Resist Technology and Processing V
Scott A. MacDonald, Editor(s)

© SPIE. Terms of Use
Back to Top