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Proceedings Paper

New 2-Diazocyclohexane-1,3-Dione Photoactive Compounds For Deep U.V. Lithography
Author(s): George Schwartzkopf
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Paper Abstract

The title compounds have been examined as photoactive components of two-part deep UV photoresists. All of the materials synthesized were soluble in typical photoresist solvents. Some were completely retained in photoresist layers baked at 95°C. The dependence of diazo compound retention on structure is discussed. Typical UV spectra of these photoresists are shown as well as the changes that occur on deep UV irradiation. Examples of typical development curves and PROSIM resist profiles are shown.

Paper Details

Date Published: 1 January 1988
PDF: 9 pages
Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); doi: 10.1117/12.968301
Show Author Affiliations
George Schwartzkopf, J.T. Baker Inc. (United States)

Published in SPIE Proceedings Vol. 0920:
Advances in Resist Technology and Processing V
Scott A. MacDonald, Editor(s)

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