Proceedings Paper
New 2-Diazocyclohexane-1,3-Dione Photoactive Compounds For Deep U.V. Lithography| Format | Member Price | Non-Member Price |
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Paper Abstract
The title compounds have been examined as photoactive components of two-part deep UV photoresists. All of the materials synthesized were soluble in typical photoresist solvents. Some were completely retained in photoresist layers baked at 95°C. The dependence of diazo compound retention on structure is discussed. Typical UV spectra of these photoresists are shown as well as the changes that occur on deep UV irradiation. Examples of typical development curves and PROSIM resist profiles are shown.
Paper Details
Date Published: 1 January 1988
PDF: 9 pages
Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); doi: 10.1117/12.968301
Published in SPIE Proceedings Vol. 0920:
Advances in Resist Technology and Processing V
Scott A. MacDonald, Editor(s)
PDF: 9 pages
Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); doi: 10.1117/12.968301
Show Author Affiliations
George Schwartzkopf, J.T. Baker Inc. (United States)
Published in SPIE Proceedings Vol. 0920:
Advances in Resist Technology and Processing V
Scott A. MacDonald, Editor(s)
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