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Proceedings Paper

Negative Bleaching Photoresist (BLEST) For Mid-UV Exposure
Author(s): Minoru Toriumi; Takumi Ueno; Takao Iwayanagi; Michiaki Hashimoto; Noboru Moriuchi; Sei-ichiro Shirai
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Paper Abstract

The design and preparation of a mid-UV negative bleaching photoresist (BLEST) are described. This two-component resist system is composed of a cresol novolac resin and 4,4'-diazido-3,3'-dimethoxybiphenyl. BLEST is a negative working resist which has the advantage of alleviating optical interference effects caused by reflection from the topograhic features on the substrate surface. The resist is characterized by its photobleaching controllability which helps incident UV light to penetrate more deeply, thus realizing a high aspect ratio. BLEST was exposed to mid-UV light and developed in a tetramethylammoniumhydroxide aqueous solution. The sensitivity of the resist was about 150 mJ/cm2 and contrast was 1.7. A good resist profile was obtained by printing on a Perkin-Elmer Micralign 500 system.

Paper Details

Date Published: 1 January 1988
PDF: 6 pages
Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); doi: 10.1117/12.968298
Show Author Affiliations
Minoru Toriumi, Hitachi, Ltd. (Japan)
Takumi Ueno, Hitachi, Ltd. (Japan)
Takao Iwayanagi, Hitachi, Ltd. (Japan)
Michiaki Hashimoto, Hitachi, Ltd. (Japan)
Noboru Moriuchi, Hitachi, Ltd. (Japan)
Sei-ichiro Shirai, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 0920:
Advances in Resist Technology and Processing V
Scott A. MacDonald, Editor(s)

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