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Proceedings Paper

Ellipsometry As A Real-Time Deposition Monitor
Author(s): R. L. Hall; W. H. Southwell; W. J. Gunning
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Paper Abstract

The use of an ellipsometer as an in situ thin film deposition monitor is usually complicated by the calculations required to arrive at an estimate of the index and thickness values. In general, the ellipsometer parameters Φ and Δ are derived from the measured readings. The calculation for index and thickness from the (Φ and Δ values is by successive approximation and can require considerable time. Because of this, real-time control is not possible even for modest evaporation rates. The direct use of the Fourier coefficients of the signal from the ellipsometer analyzer can significantly increase the data acquisition rate. One quick way to analyze the data from the ellipsometer is to compare the numerical Fourier analysis of the ellipsometer signal with the expected values calculated prior to the deposition. Several commercial ellipsometers can provide such a signal for accurate layer thickness measurements, in near real-time, during the thin film coating process, thus, enabling computer control of multiple evaporation sources. Variations of the measured ellipsometer Fourier parameters can provide a great deal of information on the index, thickness, and inhomogeneity of the film during growth. A method for realizing the above is presented, along with examples of films grown using this technique.

Paper Details

Date Published: 1 January 1987
PDF: 6 pages
Proc. SPIE 0818, Current Developments in Optical Engineering II, (1 January 1987); doi: 10.1117/12.967442
Show Author Affiliations
R. L. Hall, Rockwell International Science Center (United States)
W. H. Southwell, Rockwell International Science Center (United States)
W. J. Gunning, Rockwell International Science Center (United States)


Published in SPIE Proceedings Vol. 0818:
Current Developments in Optical Engineering II
Robert E. Fischer; Warren J. Smith, Editor(s)

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