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Proceedings Paper

High-Speed Reticle Qualification System
Author(s): Hirobumi Ishihara; Tokuro Sooma; Morio Misonoo; Kei Takatsu; Kiyohiko Akanuma
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Paper Abstract

Wafer steppers play an important role in VLSI production. However, wafer exposure by a stepper requires both a perfect or defect-free reticle and an elaborate resist process. When a reticle is produced by mask shop its perfection or pattern integrity is guarantteed with a reticle inspection system. When introduced and used in the VLSI production, however, the reticle sometimes becomes defective due to falling particles and/or chrominum peel-off caused by inadequate reticle cleaning. Even with a pellicle, the reticle gets contaminated with dusts caused by careless handling. Therefore, the in-situ reticle inspection or reticle qualification is necessary to secure the exposure of product wafers.

Paper Details

Date Published: 1 January 1987
PDF: 8 pages
Proc. SPIE 0772, Optical Microlithography VI, (1 January 1987); doi: 10.1117/12.967057
Show Author Affiliations
Hirobumi Ishihara, SONY Corporation Atsugi Plant (Japan)
Tokuro Sooma, SONY Corporation Atsugi Plant (Japan)
Morio Misonoo, SONY Corporation Atsugi Plant (Japan)
Kei Takatsu, SONY Corporation Atsugi Plant (Japan)
Kiyohiko Akanuma, SONY Corporation Atsugi Plant (Japan)

Published in SPIE Proceedings Vol. 0772:
Optical Microlithography VI
Harry L. Stover, Editor(s)

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