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Proceedings Paper

Photomask Protection Using Glass Coverplates
Author(s): Terrence E. Zavecz; Edward L. Banks
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Paper Abstract

The physical concepts and yield advantages of pellicle protected masks have been reported in many papers. Pellicle disadvantages such as fragility and the hazard of particles trapped under the membrane have been greatly outweighed by the observed chip yield increase. Yet the pellicle provides no protection against static discharge, the dislodgement of previously electrostatically fixed particles, pellicle degradation and surface etch faults.

Paper Details

Date Published: 1 January 1987
PDF: 8 pages
Proc. SPIE 0772, Optical Microlithography VI, (1 January 1987); doi: 10.1117/12.967054
Show Author Affiliations
Terrence E. Zavecz, KLA Instruments (United States)
Edward L. Banks, Icco. Inc. (United States)

Published in SPIE Proceedings Vol. 0772:
Optical Microlithography VI
Harry L. Stover, Editor(s)

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