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Proceedings Paper

Liquid Particle Counting - Part Ii Methodology Development And Statistical Process Control
Author(s): Jeffrey K. Hecht; Edward J. Reardon; Douglas A. Thompson
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Paper Abstract

Liquid particle counting (LPC) based upon laser light scattering technology continues to find wide applications in semiconductor manufacturing. Because defect levels in semiconductor devices are related to cleanliness of the processing chemicals, both users and vendors of photoresists and auxiliaries have expended efforts toward LPC testing programs. This paper describes Dynachem's approach to solving problems that have made vendor-user correlations difficult and have prevented setting of meaningful specifications. The paper also discusses how statistical process control can be applied to production of photoresists and developers. As demonstrated in the following discussions, the combination of statistical process control and particulate analysis is powerful and should help vendors and users move toward their goals of specification development.

Paper Details

Date Published: 1 January 1987
PDF: 7 pages
Proc. SPIE 0772, Optical Microlithography VI, (1 January 1987); doi: 10.1117/12.967049
Show Author Affiliations
Jeffrey K. Hecht, Morton Thiokol, Inc. (United States)
Edward J. Reardon, Morton Thiokol, Inc. (United States)
Douglas A. Thompson, Morton Thiokol, Inc. (United States)


Published in SPIE Proceedings Vol. 0772:
Optical Microlithography VI
Harry L. Stover, Editor(s)

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