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Proceedings Paper

Dark Field Technology - A Practical Approach To Local Alignment
Author(s): David R. Beaulieu; Paul P. Hellebrekers
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Paper Abstract

A fully automated direct reticle reference alignment system for use in step and repeat camera systems is described. The technique, first outlined by Janus S. Wilczynski, ("Optical Step and Repeat Camera with Dark Field Alignment", J. Vac. Technol., 16(6), Nov./Dec. 1979), has been implemented on GCA Corporation's DSW Wafer Stepper®. Results from various process levels covering the typical CMOS process have shown that better than ±0.2μm alignment accuracy can be obtained with minimal process sensitivity. The technique employs fixed illumination and microscope optics to achieve excellent registration stability and maintenance-free operation. Latent image techniques can be exploited for intra-field, grid and focus characterization.

Paper Details

Date Published: 1 January 1987
PDF: 10 pages
Proc. SPIE 0772, Optical Microlithography VI, (1 January 1987); doi: 10.1117/12.967043
Show Author Affiliations
David R. Beaulieu, GCA Corporation (United States)
Paul P. Hellebrekers, GCA Corporation (United States)


Published in SPIE Proceedings Vol. 0772:
Optical Microlithography VI
Harry L. Stover, Editor(s)

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