Proceedings PaperChairman's Pre-Conference Overview. Lens Specifications And Distortions
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As high-volume chip production presses into submicron design rules, parasitic error sources in imaging and overlay may be reduced still another factor of two. Variable magnification, and magnification and focus corrections to compensate for barometric pressure changes, for example, illustrate how some imaging/overlay error sources can be dramatically reduced. Another error source in imaging/overlay now receiving considerable attention is lens distortion; lens distortion on the order of 0.2 micron can be a substantial fraction of the error budget for overlay between matched wafer steppers in production of chips with submicron design rules.