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Proceedings Paper

Chairman's Pre-Conference Overview. Lens Specifications And Distortions
Author(s): Harry L. Stover
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Paper Abstract

As high-volume chip production presses into submicron design rules, parasitic error sources in imaging and overlay may be reduced still another factor of two. Variable magnification, and magnification and focus corrections to compensate for barometric pressure changes, for example, illustrate how some imaging/overlay error sources can be dramatically reduced. Another error source in imaging/overlay now receiving considerable attention is lens distortion; lens distortion on the order of 0.2 micron can be a substantial fraction of the error budget for overlay between matched wafer steppers in production of chips with submicron design rules.

Paper Details

Date Published: 1 January 1987
PDF: 4 pages
Proc. SPIE 0772, Optical Microlithography VI, (1 January 1987); doi: 10.1117/12.967028
Show Author Affiliations
Harry L. Stover, ASET (United States)


Published in SPIE Proceedings Vol. 0772:
Optical Microlithography VI
Harry L. Stover, Editor(s)

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