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Intracavity Laser Spectroscopy: Chemical Vapor Deposition And Supersonic Jet Expansions| Format | Member Price | Non-Member Price |
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Paper Abstract
The high sensitivity of intracavity laser spectroscopy (ILS) for direct, quantitative detection of species at low concentrations and in special environments has been well established. In this paper, we demonstrate the use of ILS to obtain rotationally-resolved absorption spectra of (i) reactive radical species in situ during chemical vapor deposition (CVD) processes used to produce silicon films and (ii) ultra-cold gas phase molecules and van der Waals (vdW) complexes produced in supersonic jet expansions. Information on the chemistry of CVD processes for a number of silicon source materials and the formation efficiencies, stability and excited-state dissociation dynamics for a series of I2-noble gas vdW complexes is presented.
Paper Details
Date Published: 1 January 1987
PDF: 9 pages
Proc. SPIE 0742, Laser Applications to Chemical Dynamics, (1 January 1987); doi: 10.1117/12.966909
Published in SPIE Proceedings Vol. 0742:
Laser Applications to Chemical Dynamics
Mostafa A. El-Sayed, Editor(s)
PDF: 9 pages
Proc. SPIE 0742, Laser Applications to Chemical Dynamics, (1 January 1987); doi: 10.1117/12.966909
Show Author Affiliations
J. J. O'Brien, University of Arizona (United States)
N. Goldstein, University of Arizona (United States)
N. Goldstein, University of Arizona (United States)
G. H. Atkinson, University of Arizona (United States)
Published in SPIE Proceedings Vol. 0742:
Laser Applications to Chemical Dynamics
Mostafa A. El-Sayed, Editor(s)
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