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Proceedings Paper

E-beam based mask repair as door opener for defect free EUV masks
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Paper Abstract

The EUV-photomask is used as mirror and no longer as transmissive device. In order to yield defect-free reticles, repair capability is required for defects in the absorber and for defects in the mirror. Defects can propagate between the EUV mask layers, which makes the detection and the repair complex or impossible if conventional methods are used. In this paper we give an overview of the different defect types. We discuss the EUV repair requirements including SEM-invisible multilayer defects and blank defects, and demonstrate e-beam repair performance. The repairs are qualified by SEM, AFM and wafer prints. Furthermore a new repair strategy involving in-situ AFM is introduced. This new strategy is applied on natural defects and the repair quality is verified using state of the art EUV wafer printing technology.

Paper Details

Date Published: 8 November 2012
PDF: 10 pages
Proc. SPIE 8522, Photomask Technology 2012, 85221M (8 November 2012); doi: 10.1117/12.966387
Show Author Affiliations
Markus Waiblinger, Carl Zeiss SMS GmbH (Germany)
Tristan Bret, Carl Zeiss SMS GmbH (Germany)
Rik Jonckheere, IMEC (Belgium)
Dieter Van den Heuvel, IMEC (Belgium)


Published in SPIE Proceedings Vol. 8522:
Photomask Technology 2012
Frank E. Abboud; Thomas B. Faure, Editor(s)

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