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Proceedings Paper

Normal Incidence Multilayer Mirrors For Extreme Ultraviolet Astronomy
Author(s): Robert A Stern; Bernhard M Haisch; George Joki; Richard C Catura
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Paper Abstract

Sputtered multilayer coatings allow the use of normal incidence optics in the extreme ultraviolet (EUV) region below 500 R. Multilayer mirrors can be tailored to provide images at strong EUV lines in the sun and stars, in many cases making more efficient use of the telescope aperture than grazing incidence optics. Alternatively, the bandpass can be broadened at the expense of peak effective area, by varying the multilayer structure over the mirror surface. Such mirrors can also serve as optical elements in spectrographs for investigation of specific emission and absorption line complexes, and are self-filtering in that they reject nearby geocoronal and cosmic resonance line backgrounds. Current efforts at the Lockheed Palo Alto Research Laboratory in the design, fabrication, and testing of EUV multilayer mirrrors are discussed. This program includes the design and fabrication of normal incidence EUV multilayer mirrors, and the deposition of multilayers on lacquer-coated substrates.

Paper Details

Date Published: 9 January 1984
PDF: 11 pages
Proc. SPIE 0445, Instrumentation in Astronomy V, (9 January 1984); doi: 10.1117/12.966166
Show Author Affiliations
Robert A Stern, Lockheed Palo Alto Research Laboratory (United States)
Bernhard M Haisch, Lockheed Palo Alto Research Laboratory (United States)
George Joki, Lockheed Palo Alto Research Laboratory (United States)
Richard C Catura, Lockheed Palo Alto Research Laboratory (United States)

Published in SPIE Proceedings Vol. 0445:
Instrumentation in Astronomy V
Alec Boksenberg; David L. Crawford, Editor(s)

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