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Proceedings Paper

Ultraviolet And X-Ray Lithography
Author(s): D. J. Nagel
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Paper Abstract

Characteristics of the generation and absorption of ultraviolet radiation and x-rays are examined for their effects on lithographic replication of tine scale features. Direct-write, projection, proximity and contact UV lithography are Drietly reviewed. Emphasis is given to x-ray lithography, especially the wide variety of potentially useful plasma x-ray sources. Reference is also made to other aspects of x-ray lithography, namely masks, resists and alignments, as well as full x-ray exposure systems.

Paper Details

Date Published: 9 November 1981
PDF: 14 pages
Proc. SPIE 0279, Ultraviolet and Vacuum Ultraviolet Systems, (9 November 1981); doi: 10.1117/12.965712
Show Author Affiliations
D. J. Nagel, Naval Research Laboratory (United States)

Published in SPIE Proceedings Vol. 0279:
Ultraviolet and Vacuum Ultraviolet Systems
William R. Hunter, Editor(s)

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