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Proceedings Paper

Lithography With Metallo-Organic Resists
Author(s): A. C. Pastor; R. C. Pastor; M. Braunstein; G. L. Tangonan
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Paper Abstract

Photolithography with metallo-organic resists is a relatively new addition to photo-engraving technology, and involves the chemical incorporation of inorganic constituents into photopolymerizable organic compounds, so that the photoresist functions not merely as a masking material, as in conventional photolithography, but also as the mass transference vehicle itself. The deposition of thin structured films of metal oxides with this method has been accomplished, the metal-doped resist in each case being the metal acrylate in acrylic acid, except in those cases where the metal acrylate was insoluble. Polymerization was effected with uv irradiation. The criteria for depositing other classes of inorganic compounds are outlined.

Paper Details

Date Published: 10 February 1981
PDF: 4 pages
Proc. SPIE 0240, Periodic Structures, Gratings, Moire Patterns, and Diffraction Phenomena I, (10 February 1981); doi: 10.1117/12.965629
Show Author Affiliations
A. C. Pastor, Hughes Research Laboratories (United States)
R. C. Pastor, Hughes Research Laboratories (United States)
M. Braunstein, Hughes Research Laboratories (United States)
G. L. Tangonan, Hughes Research Laboratories (United States)


Published in SPIE Proceedings Vol. 0240:
Periodic Structures, Gratings, Moire Patterns, and Diffraction Phenomena I
C. H. Chi; E. G. Loewen; C. L. O'Bryan III, Editor(s)

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