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Proceedings Paper

Dense-Pinch Photocathode
Author(s): John F Asmus; Ralph H Lovberg
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Paper Abstract

A promising approach to the generation of low-emittance e-beams for particle beam and FEL application employs a photoelectron cathode. IF such an e-beam source is to be viable at high power, a high-performance hard-UV illuminator is needed. Toward this end, experiments have been performed by illuminating a metal photocathode with the VUV radiation from a laser-guided gas-embedded high-density high-Z pinch. Such a VUV source is interesting because the plasma is created at high density and is optically thick. Thus, it is both a stable and an efficient radiator. Coupled with a copper photocathode it has generated a-beam current densities up to 60 A/sq-cm. The test device has been modified to utilize a pinch formed from a liquid jet in vacuum, rather than the laser-guided discharge in high-pressure gas. This is more suitable for rep-rate operation as it dispenses with the VUV-absorbing interposed gas, the channel-forming laser, and gas transport at high average power. A decane-jet device has been tested at 10 Hz with a peak pulse VUV power of 100 MW.

Paper Details

Date Published: 9 May 1988
PDF: 4 pages
Proc. SPIE 0873, Microwave and Particle Beam Sources and Propagation, (9 May 1988); doi: 10.1117/12.965101
Show Author Affiliations
John F Asmus, University of California (United States)
Ralph H Lovberg, University of California (United States)

Published in SPIE Proceedings Vol. 0873:
Microwave and Particle Beam Sources and Propagation
Norman Rostoker, Editor(s)

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