Share Email Print
cover

Proceedings Paper

X-Ray Lithography Using A KrF Laser-Produced Plasma
Author(s): T. Tomie; K. Koyama; N. Atoda; S . Komeiji; Y Matsumoto; A. Yaoita; I. Matsushima; M. Yano
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Experiments to demonstrate the feasibility of a small laser for x-ray lithography are discribed. Resist exposure experiment was performed by x-rays from a plasma produced by a KrF laser, 0.6 J/ 20 ns. With 50 shots exposure, a very fine pattern of 0.5 μm line & space was printed onto a resist EBR-9 at 3 cm from an iron plate target. The conditions for a laser-plasma to be a practical source for x-ray lithography are discussed.

Paper Details

Date Published: 4 February 1988
PDF: 6 pages
Proc. SPIE 0831, X-Rays from Laser Plasmas, (4 February 1988); doi: 10.1117/12.965041
Show Author Affiliations
T. Tomie, Electrotechnical Laboratory (Japan)
K. Koyama, Electrotechnical Laboratory (Japan)
N. Atoda, Electrotechnical Laboratory (Japan)
S . Komeiji, Electrotechnical Laboratory (Japan)
Y Matsumoto, Electrotechnical Laboratory (Japan)
A. Yaoita, Electrotechnical Laboratory (Japan)
I. Matsushima, Electrotechnical Laboratory (Japan)
M. Yano, Electrotechnical Laboratory (Japan)


Published in SPIE Proceedings Vol. 0831:
X-Rays from Laser Plasmas
Martin C. Richardson, Editor(s)

© SPIE. Terms of Use
Back to Top