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Proceedings Paper

X-Ray Lithography Using A KrF Laser-Produced Plasma
Author(s): T. Tomie; K. Koyama; N. Atoda; S . Komeiji; Y Matsumoto; A. Yaoita; I. Matsushima; M. Yano
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Paper Abstract

Experiments to demonstrate the feasibility of a small laser for x-ray lithography are discribed. Resist exposure experiment was performed by x-rays from a plasma produced by a KrF laser, 0.6 J/ 20 ns. With 50 shots exposure, a very fine pattern of 0.5 μm line & space was printed onto a resist EBR-9 at 3 cm from an iron plate target. The conditions for a laser-plasma to be a practical source for x-ray lithography are discussed.

Paper Details

Date Published: 4 February 1988
PDF: 6 pages
Proc. SPIE 0831, X-Rays from Laser Plasmas, (4 February 1988); doi: 10.1117/12.965041
Show Author Affiliations
T. Tomie, Electrotechnical Laboratory (Japan)
K. Koyama, Electrotechnical Laboratory (Japan)
N. Atoda, Electrotechnical Laboratory (Japan)
S . Komeiji, Electrotechnical Laboratory (Japan)
Y Matsumoto, Electrotechnical Laboratory (Japan)
A. Yaoita, Electrotechnical Laboratory (Japan)
I. Matsushima, Electrotechnical Laboratory (Japan)
M. Yano, Electrotechnical Laboratory (Japan)


Published in SPIE Proceedings Vol. 0831:
X-Rays from Laser Plasmas
Martin C. Richardson, Editor(s)

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