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Proceedings Paper

Metamaterials modelling, fabrication, and characterisation techniques
Author(s): Radu Malureanu; Maksim Zalkovskij; Andrei Andryieuski; Andrey Novitsky; Alexandra Ivinskaya; Peter Uhd Jepesen; Aurelian Popescu; Dan Savastru; Andrei Lavrinenko
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Paper Abstract

Metamaterials are artificially designed media that show averaged properties not yet encountered in nature. Among such properties, the possibility of obtaining optical magnetism and negative refraction are the ones mainly exploited but epsilon-near-zero and sub-unitary refraction index are also parameters that can be obtained. Such behaviour enables unprecedented applications. Within this work, we will present various aspects of metamaterials research field that we deal with at our department. From the modelling part, we will present tour approach for determining the field enhancement in slits that have dimensions in the 104 times smaller than the incident wavelength. This huge difference makes it almost impossible for commercial software to handle thus analytical approached have to be employed. From the fabrication point of view, various 2D and 3D high resolution patterning techniques are used. The talk will describe the ones available within our group. We will present the electron-beam lithography approach for fabricating nano-antennae to be used in coupling of plasmonics waveguides to/from free space. Also, a 3D technique based on twophoton-polymerisation and isotropic metal deposition to fabricate metal-covered 3D photonic crystals will be discussed. From the measuring side we will present two THz based setups for obtaining material’s characteristics, both in the low as well as in the high THz range, thus having the possibility of describing a material from 0.1 to 10THz.

Paper Details

Date Published: 1 November 2012
PDF: 8 pages
Proc. SPIE 8411, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies VI, 841104 (1 November 2012); doi: 10.1117/12.964986
Show Author Affiliations
Radu Malureanu, Technical Univ. of Denmark (Denmark)
Maksim Zalkovskij, Technical Univ. of Denmark (Denmark)
Andrei Andryieuski, Technical Univ. of Denmark (Denmark)
Andrey Novitsky, Technical Univ. of Denmark (Denmark)
Alexandra Ivinskaya, Technical Univ. of Denmark (Denmark)
Peter Uhd Jepesen, Technical Univ. of Denmark (Denmark)
Aurelian Popescu, INOE 2000 (Romania)
Dan Savastru, INOE 2000 (Romania)
Andrei Lavrinenko, Technical Univ. of Denmark (Denmark)


Published in SPIE Proceedings Vol. 8411:
Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies VI
Paul Schiopu; Razvan Tamas, Editor(s)

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