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Proceedings Paper

RDMS: a Windows and tablet PC based reticle defect search database with AHDC for interconnected mask and wafer fabs
Author(s): Saghir Munir; Gul Qidwai
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Paper Abstract

Ever imagine life without a search engine? Now imagine if there was a search engine for reticle defects that allowed you to search, trend size, and relate defects on any reticle from any inspection tool, in any of your interconnected fabs, at any time with a performance similar to a typical Google search. What would you do with it? With EUV upon us and the uncertainly involving EUV defect classification, it is important that the process engineers have access to as much defect data as possible. Here such data is made available on Windows based PCs and tablet computers.

Paper Details

Date Published: 8 November 2012
PDF: 8 pages
Proc. SPIE 8522, Photomask Technology 2012, 85221Z (8 November 2012); doi: 10.1117/12.964981
Show Author Affiliations
Saghir Munir, Reticle Labs. LLC (United States)
Gul Qidwai, Reticle Labs. LLC (United States)


Published in SPIE Proceedings Vol. 8522:
Photomask Technology 2012
Frank E. Abboud; Thomas B. Faure, Editor(s)

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