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Proceedings Paper

Performances Of C-W Multilayers As Soft X-Rays Optics : High Reflectivity In The Range 2d = 60 to 100 A
Author(s): Ph . Houdy; V. Bodart; C. Hily; P. Ruterana; L. Nevot; M. Arbaoui; N. Alehyane; R. Barchewitz
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Paper Abstract

Diode RF sputtering technique has been used to produce carbon-tungsten ultra thin layers stacks for application in the soft X-ray domain as optical system. In situ kinetic ellipsometry has been chosen to control the multilayers growth with a great accuracy. Grazing X-ray reflection (1.54 P., absolute soft X-ray reflectivity (44.7 Å) and cross section transmission electron microscopy results confirm a posteriori the ellipsometry ones. Deposition conditions have been optimized using these characterizations. The thick-ness fluctuations are very low (0.2 % per layer). We have observed the smoothing of the layers roughness as the number of C-W sequences increases (the substrate having a roughness of 7 Å, the layers of 2 Å). We have realized multilayers in the range 2d = 60 Å and 2d = 90 Å. Their reflectivities typically reach 8 % = 45° at 44.7 Å) for the first ones and 13 % (9- = 30° at 44.7 Å) for the second ones. We have also realized stacks with a great number of layers in the range 2d = 100 A. 17 % reflectivities have been reached for a 180 layers stack.

Paper Details

Date Published: 1 January 1986
PDF: 9 pages
Proc. SPIE 0733, Soft X-Ray Optics and Technology, (1 January 1986); doi: 10.1117/12.964935
Show Author Affiliations
Ph . Houdy, Laboratoires d' Electronique et de Physique appliqee (France)
V. Bodart, Laboratoires d' Electronique et de Physique appliqee (France)
C. Hily, Laboratoires d' Electronique et de Physique appliqee (France)
P. Ruterana, Laboratoires d' Electronique et de Physique appliqee (France)
L. Nevot, Institut d'Optique theorique et appliquee (France)
M. Arbaoui, Universite Pierre et Marie Curie (France)
N. Alehyane, Universite Pierre et Marie Curie (France)
R. Barchewitz, Universite Pierre et Marie Curie (France)


Published in SPIE Proceedings Vol. 0733:
Soft X-Ray Optics and Technology
E. Koch; Guenther A. Schmahl, Editor(s)

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